17
Development of Single Buffer Layer for Coated Conductors
by MOCVD Process—Metal Oxide
Technologies Inc. (MetOx), 8807 Emmott Road, Suite 100,
Houston, TX , 77040-3532;
832-243-0917, www.metox.biz
Dr. Alexander Molodyk, Principal Investigator, alexander.molodyk@metox.biz
Mr. Louis D. Castellani, Business Official, louis.castellani@metox.biz
DOE Grant No. DE-FG02-06ER84652
Amount: $99,994
The modernization and
expansion of America’s
electricity delivery system is needed to ensure a more reliable and robust
electricity supply. High Temperature Superconductors (HTS) are an emerging
technology for this purpose; however, current
techniques for producing the buffer layer, which lies between the
superconducting material and its metal substrate, are cumbersome. Current buffer layers actually are comprised
of multiple layers, each serving a separate function and often requiring
distinctly different deposition methods.
A simplified buffer architecture – which could be produced via a
high-rate, high-performance, cost-effective method – would allow coated
conductors to be produced at a lower cost and with greater efficiency. Therefore, this project will develop a
high-rate, high-performance, cost effective Metal Organic Chemical Vapor
Deposition (MOCVD) method for producing a single layer buffer. Phase I will prove the concept of a single
layer buffer architecture obtained by MOCVD and study the minimal thickness
necessary for such an architecture to be applicable to HTS coated
conductors. Phase II will apply these
results to the production of long lengths of coated conductor.
Commerical Applications and Other Benefits as described by the awardee: A simplified, single layer buffer
architecture should aid in the production of HTS wire and speed the use and
application of HTS coated conductors for large power devices. The projected HTS wire cost (~ $10-15/kA-m) should
open up commercial markets (in motors, transformers, transmission lines, etc.)
valued at over $5B, leading to
significant economic growth.